Deviation from Regular Shape in the Early Stages of Formation of Strain-Driven 3D InGaAs/GaAs Micro/Nanotubes

Single-crystalline InGaAs/GaAs semiconductor micro/nanotubes have been obtained by the strain-driven self-rolling mechanism. This approach combines the advantages of bottom-up (epitaxial growth) and top-down (postgrowth processing) techniques, offering an exceptional opportunity to realize complex three-dimensional nanoarchitectures by using conventional photolithography and wet-etching processes. The method employed to obtain micro/nanotubes with selected orientation and length is described in detail. By means of high-resolution scanning electron microscopy characterization, we show a clear shape difference between single-wall and multiwalls tubes and we discuss it on the basis of strain release, taking into account also possible shape deformations induced during micro/nanotubes drying. We analyse the In-segregation profile in the nominal In0.20Ga0.80As/GaAs bilayer and we show its effect on the actual diameter of the tubes, concluding that a more accurate description of the structure should consider an In0.20Ga0.80As/In0.10Ga0.90As/GaAs trilayer. This work will be useful to set up reliable methodologies for the realization of strain-driven micro/nanotubes with controlled properties, necessary for their implementation in a large number of application fields.

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